EUV pupil optimization for 32nm pitch logic structures

D. Rio; V. Blanco; J.-H. Franke; W. Gillijns; M. Dusa; E. De Poortere; P. Van Adrichem; K. Lyakhova; C. Spence; E. Hendrickx; S. Biesemans; K. Nafus

doi:10.1117/12.2503321

3 October 2018 EUV pupil optimization for 32nm pitch logic structures

D. Rio, V. Blanco, J.-H. Franke, W. Gillijns, M. Dusa, E. De Poortere, P. Van Adrichem, K. Lyakhova, C. Spence, E. Hendrickx, S. Biesemans, K. Nafus

Author Affiliations +

Proceedings Volume 10809, International Conference on Extreme Ultraviolet Lithography 2018; 108090N (2018) https://doi.org/10.1117/12.2503321
Event: SPIE Photomask Technology + Extreme Ultraviolet Lithography, 2018, Monterey, California, United States

Abstract

A pupil optimization was carried out for the M2 layer of the imec N7 (foundry N5 equivalent) logic design. This is exposed as a single print EUV layer. We focused on the printability of the toughest parts of the design: a dense line space grating of 32 nm pitch and a tip-tip grating of 32 nm pitch, tip-to-tip target CD of 25 nm. We found that the pupil optimization can improve both the line space and the tip-to-tip gratings energy latitude and depth of focus. The tip-to-tip target CD can be pushed further, enabling further design scaling.

Conference Presentation

Citation Download Citation

D. Rio, V. Blanco, J.-H. Franke, W. Gillijns, M. Dusa, E. De Poortere, P. Van Adrichem, K. Lyakhova, C. Spence, E. Hendrickx, S. Biesemans, and K. Nafus "EUV pupil optimization for 32nm pitch logic structures", Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108090N (3 October 2018); https://doi.org/10.1117/12.2503321

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