Simulation Of Latent Image Manipulation A Versatile Simulation Program For New Photolithographic Systems

R. J. Visser; H. P. Urbach; A. J. W. Tol; H. Eggink; E. G. H. M. Kemna

doi:10.1117/12.953072

30 January 1989 Simulation Of Latent Image Manipulation A Versatile Simulation Program For New Photolithographic Systems

R. J. Visser, H. P. Urbach, A. J. W. Tol, H. Eggink, E. G. H. M. Kemna

Author Affiliations +

Proceedings Volume 1086, Advances in Resist Technology and Processing VI; (1989) https://doi.org/10.1117/12.953072
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

A program for simulating latent image formation in a photoresist for complex photolithographical systems is described. For a number of new photolithographic systems, which use more than one exposure and several different chemical reactions, the concentration profiles of the chemical components of the resist can be calculated with this program. Some results for positive imaging, Image Reversal, Built In Mask and ImRe with two pattern-wise exposures are given.

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R. J. Visser, H. P. Urbach, A. J. W. Tol, H. Eggink, and E. G. H. M. Kemna "Simulation Of Latent Image Manipulation A Versatile Simulation Program For New Photolithographic Systems", Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); https://doi.org/10.1117/12.953072

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