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15 November 2019 Silicone grating fabricated using photoresist mold
Itsunari Yamada, Yusuke Ikeda
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Proceedings Volume 11175, Optifab 2019; 111751Y (2019) https://doi.org/10.1117/12.2535713
Event: SPIE Optifab, 2019, Rochester, New York, United States
Abstract
We fabricated a transmission silicone grating using two-beam interference method and imprint lithography, and evaluated its optical characteristics during a compression process. The grating pattern with ~0.4 μm depth and 1 μm pitch was created on a silicone surface by imprinting process with a photoresist mold to realize a simple, low-cost fabrication process. The first order diffraction transmittance of this grating reached ~10% at 633 nm wavelength. We also measured the relationship between the grating period and compressive stress to the fabricated elements. The grating period changed from 1 μm to ~0.8 μm by ~17% compression of the fabricated element in one direction, perpendicular to the grooves.
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Itsunari Yamada and Yusuke Ikeda "Silicone grating fabricated using photoresist mold", Proc. SPIE 11175, Optifab 2019, 111751Y (15 November 2019); https://doi.org/10.1117/12.2535713
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KEYWORDS
Diffraction gratings
Silicon
Photoresist materials
Diffraction
Optical components
Distortion
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