Nanoscale grating characterization through EUV spectroscopy aided by machine learning techniques

Lukas Bahrenberg; Sven Glabisch; Serhiy Danylyuk; Moein Ghafoori; Sophia Schröder; Sascha Brose; Jochen Stollenwerk; Peter Loosen

doi:10.1117/12.2550508

20 March 2020 Nanoscale grating characterization through EUV spectroscopy aided by machine learning techniques

Lukas Bahrenberg, Sven Glabisch, Serhiy Danylyuk, Moein Ghafoori, Sophia Schröder, Sascha Brose, Jochen Stollenwerk, Peter Loosen

Author Affiliations +

Proceedings Volume 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV; 113250X (2020) https://doi.org/10.1117/12.2550508
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

In this contribution nanoscale gratings are characterized by means of broadband EUV spectroscopy with wavelengths from 10 nm to 15 nm. The study focuses on the specifics of this spectral range that can be beneficial for metrology applications in lithography. Experimental investigations are carried out on fused silica nanoscale line gratings in a stand-alone laboratory-based setup. A corresponding sensitivity study is carried out analyzing the influence of grating parameter variations on EUV reflectance curves. Subsequently, experimental uncertainties are propagated to accuracies of grating parameter extraction. Using rigorous simulations in combination with machine learning, limitations of the technique are discussed regarding industrially relevant gratings. Extending the method through analysis of higher diffraction orders is evaluated.

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Lukas Bahrenberg, Sven Glabisch, Serhiy Danylyuk, Moein Ghafoori, Sophia Schröder, Sascha Brose, Jochen Stollenwerk, and Peter Loosen "Nanoscale grating characterization through EUV spectroscopy aided by machine learning techniques", Proc. SPIE 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV, 113250X (20 March 2020); https://doi.org/10.1117/12.2550508

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