Presentation + Paper
23 March 2020 Roughness study on line and space patterning with chemo-epitaxy directed self-assembly
Author Affiliations +
Abstract
For the introduction of directed self-assembly (DSA) process into high volume manufacturing, the roughness of pattern is one of main check points. The focus of this study is to understand the origin of DSA roughness and to discuss the strategies to improve DSA-specific roughness. 3X DSA LiNe flow with PS-b-PMMA was used as a model case. Unbiased line edge roughness (LER) and linewidth roughness (LWR) were measured using power spectral density (PSD) analysis on CDSEM images. We found that low frequency LER is particularly sensitive to the assembly conditions. By optimizing material and process conditions, unbiased LWR was reduced by about 10%, while unbiased LER was reduced by about 15%.
Conference Presentation
© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hyo Seon Suh, Viktor Dudash, Gian Lorusso, and Chris Mack "Roughness study on line and space patterning with chemo-epitaxy directed self-assembly", Proc. SPIE 11326, Advances in Patterning Materials and Processes XXXVII, 113260X (23 March 2020); https://doi.org/10.1117/12.2552354
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KEYWORDS
Directed self assembly

Line edge roughness

Annealing

Line width roughness

Temperature metrology

Optical lithography

Etching

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