Presentation
21 August 2020 Block copolymer lithography for scalable near-infrared graphene plasmonic devices
Author Affiliations +
Abstract
Patterning graphene into nanostructures enables the coupling of free space radiation to plasmons in graphene. These plasmons are highly tunable and have been used in such applications as tunable filters and chemical sensors in the THz and mid-infrared ranges, with graphene structures with characteristic dimensions of 15 nm of greater. Here, we will demonstrate that block copolymer based fabrication can create sub 15 nm plasmonically active graphene nanostructures in a scalable, efficient, and repeatable manner. Furthermore, we will report the first measurement of a near-infrared graphene plasmon resonance and discuss some implications for next-generation optoelectrical devices.
Conference Presentation
© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joel Siegel, Jonathan H. Dwyer, Anjali Suresh, Margaret Fortman, Nathaniel S. Safron, Chenghao Wan, Jonathan Choi, Wei Wei, Vivek Saraswat, Mikhail A. Kats, Michael S. Arnold, Padma Gopalan, and Victor W. Brar "Block copolymer lithography for scalable near-infrared graphene plasmonic devices", Proc. SPIE 11467, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVII, 114670E (21 August 2020); https://doi.org/10.1117/12.2571066
Advertisement
Advertisement
KEYWORDS
Graphene

Lithography

Plasmonics

Nanostructures

Plasmons

Nanolithography

Chemical fiber sensors

Back to Top