Actinic mask imaging using EUV ptychography microscope

Young Woong Kim; Byungmin Yoo; Dong Gi Lee; Chang Mo Ku; Joong Hwee Cho; Jinho Ahn

doi:10.1117/12.2587895

22 February 2021 Actinic mask imaging using EUV ptychography microscope

Young Woong Kim, Byungmin Yoo, Dong Gi Lee, Chang Mo Ku, Joong Hwee Cho, Jinho Ahn

Proceedings Volume 11609, Extreme Ultraviolet (EUV) Lithography XII; 116091Y (2021) https://doi.org/10.1117/12.2587895
Event: SPIE Advanced Lithography, 2021, Online Only

Conference Poster

Abstract

In this study, we carried out actinic EUV mask imaging using EUV ptychography microscope with an updated algorithm. To improve the illumination probe update and the reconstruction quality, we adopted the regularized ptychographic iterative engine (rPIE) with intensity correction. The amplitude and phase of line and space patterns were reconstructed and verified quantitatively. The demonstrated performance of EUV ptychography microscope will be helpful for mask qualification and development of the advanced attenuated phase-shift masks (attPSMs).

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Citation Download Citation

Young Woong Kim, Byungmin Yoo, Dong Gi Lee, Chang Mo Ku, Joong Hwee Cho, and Jinho Ahn "Actinic mask imaging using EUV ptychography microscope", Proc. SPIE 11609, Extreme Ultraviolet (EUV) Lithography XII, 116091Y (22 February 2021); https://doi.org/10.1117/12.2587895

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