Overlay models for nanoimprint lithography

Nilabh Roy; Mario Meissl; Takahiro Yoshida; Anshuman Cherala; Xiaoming Lu; Jeffrey Klein; Mingji Lou; Jin Choi; Hiroyuki Sekiguchi; Takashi Shibayama; Mitsuru Hiura

doi:10.1117/12.2584742

1 March 2021 Overlay models for nanoimprint lithography

Nilabh Roy, Mario Meissl, Takahiro Yoshida, Anshuman Cherala, Xiaoming Lu, Jeffrey Klein, Mingji Lou, Jin Choi, Hiroyuki Sekiguchi, Takashi Shibayama, Mitsuru Hiura

Author Affiliations +

Proceedings Volume 11610, Novel Patterning Technologies 2021; 1161006 (2021) https://doi.org/10.1117/12.2584742
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

The integration of a NIL into production for advanced memory devices will require compatibility with existing high-end optical lithography processes in order to meet the aggressive overlay performance specifications. To deliver such a demanding overlay specification, it is necessary for NIL to achieve reliable alignment and to expand its overlay error budget to include as many as higher-order error components along with their countermeasure options. In this paper, NIL overlay models have been developed to address alignment of full fields and partial fields.

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Nilabh Roy, Mario Meissl, Takahiro Yoshida, Anshuman Cherala, Xiaoming Lu, Jeffrey Klein, Mingji Lou, Jin Choi, Hiroyuki Sekiguchi, Takashi Shibayama, and Mitsuru Hiura "Overlay models for nanoimprint lithography", Proc. SPIE 11610, Novel Patterning Technologies 2021, 1161006 (1 March 2021); https://doi.org/10.1117/12.2584742

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