Design of block copolymers for directed self-assembly

Paul F. Nealey

doi:10.1117/12.2584926

22 February 2021 Design of block copolymers for directed self-assembly

Paul F. Nealey

Proceedings Volume 11610, Novel Patterning Technologies 2021; 116100K (2021) https://doi.org/10.1117/12.2584926
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

Design rules for block copolymer (BCP) materials used in directed self-assembly (DSA) to meet the constraints for manufacturing were defined in a combined experimental and theoretical approach to quantitative three-dimensional characterization of nanoscale structure and analysis of defect annihilation kinetics and mechanisms. Subsequently we developed a materials platform based on (A-block-(B-random-C) architectures to satisfy those design rules to enable current and future patterning resolution requirements. We realize feature size-specific BCPs (18 to 8 nm full pitch) with balanced block surface energies between blocks for thermal annealing, controllable segregation strength for simultaneous optimization of defectivity and dimensional uniformity, and etch selectivity.

Conference Presentation

Citation Download Citation

Paul F. Nealey "Design of block copolymers for directed self-assembly", Proc. SPIE 11610, Novel Patterning Technologies 2021, 116100K (22 February 2021); https://doi.org/10.1117/12.2584926

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