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5 March 2021 150mm full wafer fabrication and characterization of 940nm emitting VCSELs for high-volume manufacture
David G. Hayes, Tomas Peach, Jack Baker, Sara-Jayne Gillgrass, Craig P. Allford, Angela Sobiesierski, Connie Eng, Saleem Shabbir, Stuart Thomas, Curtis Hentschel, Clive Meaton, Samuel Shutts, Aidan Daly, Tracy Sweet, Iwan Davies, Peter M. Smowton
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Proceedings Volume 11704, Vertical-Cavity Surface-Emitting Lasers XXV; 1170406 (2021) https://doi.org/10.1117/12.2578592
Event: SPIE OPTO, 2021, Online Only
Abstract
High-volume low-cost production of vertical cavity surface emitting lasers (VCSELs) will allow their exploitation in new commodity markets. We report the successful scaling up from research level fabrication to produce oxide confined VCSELs across a whole 150mm wafer. On-wafer light-current-voltage (L-I-V) and spectral measurements are analyzed to determine the cross-wafer variations in threshold current, threshold current densities and emission wavelength, which is compared with reflectivity measurements taken immediately after growth. We examine the dependence of VCSEL performance on fabrication parameters over a range of device dimensions to assess whether variation arises from non-uniformity of the epitaxial material or wafer processing.
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David G. Hayes, Tomas Peach, Jack Baker, Sara-Jayne Gillgrass, Craig P. Allford, Angela Sobiesierski, Connie Eng, Saleem Shabbir, Stuart Thomas, Curtis Hentschel, Clive Meaton, Samuel Shutts, Aidan Daly, Tracy Sweet, Iwan Davies, and Peter M. Smowton "150mm full wafer fabrication and characterization of 940nm emitting VCSELs for high-volume manufacture", Proc. SPIE 11704, Vertical-Cavity Surface-Emitting Lasers XXV, 1170406 (5 March 2021); https://doi.org/10.1117/12.2578592
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KEYWORDS
Semiconducting wafers
Vertical cavity surface emitting lasers
Manufacturing
Analytical research
Electro optics
Oxides
Photoresist materials
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