Paper
1 June 1990 Chemically produced XeF(B) electronic excited state
Robert D. Bower, Tientsai T. Yang
Author Affiliations +
Proceedings Volume 1225, High-Power Gas Lasers; (1990) https://doi.org/10.1117/12.18482
Event: OE/LASE '90, 1990, Los Angeles, CA, United States
Abstract
XeF(B) has been observed in the reaction of SiH4 + 2 + XeF2. dependence of XeF(B) emission intensity on [XeF2], [F2], [SiH4] and [Ar] has been measured. Possible mechanisims of XeF(B) production is discussed.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert D. Bower and Tientsai T. Yang "Chemically produced XeF(B) electronic excited state", Proc. SPIE 1225, High-Power Gas Lasers, (1 June 1990); https://doi.org/10.1117/12.18482
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Cited by 1 scholarly publication.
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KEYWORDS
Fluorine

Argon

Hydrogen fluoride lasers

Molecules

Industrial chemicals

Molecular lasers

Chemical reactions

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