Paper
1 May 1990 Powerful subpicosecond KrF laser for x-ray laser development in the 1-5-nm region
William Tighe, ChangHee Nam, Julius Goldhar, Lewis D. Meixler, John A. Robinson, Ernie J. Valeo, Szymon Suckewer
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Abstract
A high power, 300 fsec pulse duration, ultraviolet KrF laser system has been developed as a pump laser for short wavelength X-ray lasers. Additions and improvements to the laser system will be described. Attempts to reduce the effect of amplified spontaneous emission (ASE) through the use of spatial filters, saturable absorbers and target design will be discussed. Improvements to the optical system have been made in order to provide a 3 jtm focal spot size with care being taken not to introduce significant broadening of the pulse duration. It is estimated that focal spot intensities in excess of 1018 W/cm2 have been obtained on target. Soft X-ray spectra resulting from various laser-target experiments will be presented. Theoretical schemes for the development of X-ray lasing in the wavelength region of 1-5 nm will be discussed.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
William Tighe, ChangHee Nam, Julius Goldhar, Lewis D. Meixler, John A. Robinson, Ernie J. Valeo, and Szymon Suckewer "Powerful subpicosecond KrF laser for x-ray laser development in the 1-5-nm region", Proc. SPIE 1229, Femtosecond to Nanosecond High-Intensity Lasers and Applications, (1 May 1990); https://doi.org/10.1117/12.18655
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Cited by 1 scholarly publication.
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KEYWORDS
Plasma

X-ray lasers

Optical amplifiers

X-rays

Ionization

Laser development

Pulsed laser operation

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