Paper
15 September 2022 Status of curvilinear data format working group
Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, Sanghee Lee, Peter Buck, Bhardwaj Durvasula, Sayalee Gharat, Vlad Liubich
Author Affiliations +
Abstract
For the era of multi-beam mask writer, in the 2019 BACUS conference, we proposed the formation of a data format working group to address the need for curvilinear data representation. The new working group was formed in October 2019 driven by major semiconductor companies with representations from Mentor, Synopsys, Nippon Control Systems, D2S, Aselta, and ASML-BRION with the initial goals to quantify the curvilinear data volume problem; develop, test and implement new or revised formats based on OASIS; and to formalize the working group as a SEMI task force (TF). In this paper, the necessity of a new curvilinear data format and the progress of our TF will be introduced. Furthermore, we demonstrate that given the nature of curvilinear data, representing it using native curve formats has significant value to reduce file size for future mask making flows.
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, Sanghee Lee, Peter Buck, Bhardwaj Durvasula, Sayalee Gharat, and Vlad Liubich "Status of curvilinear data format working group", Proc. SPIE 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1232508 (15 September 2022); https://doi.org/10.1117/12.2641557
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Photomasks

Optical proximity correction

Extreme ultraviolet

Mask making

Optical lithography

RELATED CONTENT

TrueMask ILT MWCO full chip curvilinear ILT in a...
Proceedings of SPIE (March 31 2020)
Requirements and results of a full-field EUV OPC flow
Proceedings of SPIE (March 17 2009)
Lithography tricks and tribulations
Proceedings of SPIE (December 27 1996)
Mask costs: a new look
Proceedings of SPIE (June 27 2006)
Lithography strategy for 65-nm node
Proceedings of SPIE (August 01 2002)

Back to Top