Diamond-like-carbon as a novel capping material for EUV mask blanks

Katrina Rook; JoJo Daof; Antonio Checco; Mohammad Saghayezhian; Kenji Yamamoto; Meng H. Lee; Marjorie Chee

doi:10.1117/12.2642182

15 September 2022 Diamond-like-carbon as a novel capping material for EUV mask blanks

Katrina Rook, JoJo Daof, Antonio Checco, Mohammad Saghayezhian, Kenji Yamamoto, Meng H. Lee, Marjorie Chee

Proceedings Volume 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology; 123250F (2022) https://doi.org/10.1117/12.2642182
Event: Photomask Japan 2022, 2022, Online Only

Abstract

Experimental data, and optical calculations, are presented for the impact of Ruthenium and Diamond-Like Carbon (DLC) capping layers on the EUV reflectivity (EUVR) of Mo/Si multilayers. The multilayers and Ruthenium are deposited by secondary ion beam deposition, while the DLC is deposited by Pulsed Filtered Cathodic Arc. In both cases, the optimal capping layer thickness is shown to be ~ 2.5nm, providing the smallest degradation from the baseline multilayer reflectivity. 2.5nm Ruthenium is demonstrated to result in a drop of 1.8% reflectivity relative to the bare multilayer. In contrast, 2.5nm of DLC results in a drop of only 0.6%, so 1.2% improvement over the typical Ruthenium cap. Optical calculations support the qualitative features of the experimental data, with closer matching when realistic interlayers (1.5nm RuSi or 0.5nm C/Si) and realistic oxide layers (0.6nm RuO2) are included.

Citation Download Citation

Katrina Rook, JoJo Daof, Antonio Checco, Mohammad Saghayezhian, Kenji Yamamoto, Meng H. Lee, and Marjorie Chee "Diamond-like-carbon as a novel capping material for EUV mask blanks", Proc. SPIE 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 123250F (15 September 2022); https://doi.org/10.1117/12.2642182

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