EPE-aware process optimization for scanner dose and overlay in DRAM use case

Inho Kwak; Nanhyung Kim; Inbeom Yim; Jeongjin Lee; Seung Yoon Lee; Chan Hwang; Pieter Brandt; Kateryna Lyakhova; Marco Mueller; Ferhad Kamalizadeh; Antonio Corradi; Yun-A Sung; Thomas Kim; Stefan Smith-Meerman; Stefan van der Sanden; Sung-Min Park; Bob Boo; Hyok-Man Kwon

doi:10.1117/12.2658274

27 April 2023 EPE-aware process optimization for scanner dose and overlay in DRAM use case

Inho Kwak, Nanhyung Kim, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Pieter Brandt, Kateryna Lyakhova, Marco Mueller, Ferhad Kamalizadeh, Antonio Corradi, Yun-A Sung, Thomas Kim, Stefan Smith-Meerman, Stefan van der Sanden, Sung-Min Park, Bob Boo, Hyok-Man Kwon

Author Affiliations +

Proceedings Volume 12496, Metrology, Inspection, and Process Control XXXVII; 124960N (2023) https://doi.org/10.1117/12.2658274
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

In this paper the use of the EPE metric directly in the process optimization method for a DRAM use case has been researched. We show that EPE-aware optimization, using scanner dose and overlay control sub-recipes, is outperforming conventional optimization in terms of EPE Dies in Spec. Hence, it can be expected that also device yield can be improved by EPE-aware control.

Conference Presentation

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Inho Kwak, Nanhyung Kim, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Pieter Brandt, Kateryna Lyakhova, Marco Mueller, Ferhad Kamalizadeh, Antonio Corradi, Yun-A Sung, Thomas Kim, Stefan Smith-Meerman, Stefan van der Sanden, Sung-Min Park, Bob Boo, and Hyok-Man Kwon "EPE-aware process optimization for scanner dose and overlay in DRAM use case", Proc. SPIE 12496, Metrology, Inspection, and Process Control XXXVII, 124960N (27 April 2023); https://doi.org/10.1117/12.2658274

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