Chemical amplification negative resist systems composed of novolac, silanols, and acid generators

Takumi Ueno; Hiroshi Shiraishi; Nobuaki Hayashi; Keiko Tadano; Emiko Fukuma; Takao Iwayanagi

doi:10.1117/12.20085

1 June 1990 Chemical amplification negative resist systems composed of novolac, silanols, and acid generators

Takumi Ueno, Hiroshi Shiraishi, Nobuaki Hayashi, Keiko Tadano, Emiko Fukuma, Takao Iwayanagi

Proceedings Volume 1262, Advances in Resist Technology and Processing VII; (1990) https://doi.org/10.1117/12.20085
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

Negative chemical amplification resist systems composed of Novolak resin, a silanol compound, and an acid generator are investigated as deep UV resists. The acid produced in the exposed area induces the condensation reaction of silanol compounds during post-exposure baking. The condensation reaction products, siloxanes, act as an aqueous-base dissolution inhibitor, while silanol compounds in unexposed area work as aqueous base dissolution promoters. The resist composed of Novolak resin, diphenylsilanediol, and triphenylsulfonium triflate shows quite high sensitivity (-.-lmJ/cm2). Using this resist, O.3pm line-and-space patterns were obtained by KrF excimer laser stepper with 3mJ/cm2 dose.

Citation Download Citation

Takumi Ueno, Hiroshi Shiraishi, Nobuaki Hayashi, Keiko Tadano, Emiko Fukuma, and Takao Iwayanagi "Chemical amplification negative resist systems composed of novolac, silanols, and acid generators", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); https://doi.org/10.1117/12.20085

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