Paper
1 June 1990 Studies of the molecular mechanism of dissolution inhibition of positive photoresists based on novolac-DNQ
Kenji Honda, Bernard T. Beauchemin Jr., Rodney J. Hurditch, Andrew J. Blakeney, Yasumasa Kawabe, Tadayoshi Kokubo
Author Affiliations +
Abstract
effects in the development process. A comprehensive theory ofdissolution inhibition in novolak-DNQ (diazonaphthoquinone) resist is proposed, which is based on experimental studies of novolak-PAC (photoactive compound) interactions and the relationship between novolak microstructres and dissolution inhibition. The theory invokes a "two-step mechanism". Static molecular interactions between novolak and DNQ are augmented by secondary dynamic
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kenji Honda, Bernard T. Beauchemin Jr., Rodney J. Hurditch, Andrew J. Blakeney, Yasumasa Kawabe, and Tadayoshi Kokubo "Studies of the molecular mechanism of dissolution inhibition of positive photoresists based on novolac-DNQ", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); https://doi.org/10.1117/12.20104
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Cited by 15 scholarly publications.
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KEYWORDS
Hydrogen

Picture Archiving and Communication System

Photoresist materials

Polymers

Molecular interactions

Semiconducting wafers

Molecular mechanisms

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