Training dataset optimization for deep learning applied to optical proximity correction on non-regular hole masks

Mathis Urard; Clément Paquet; Charlotte Beylier; Jean-Noël Pena; Alice Caplier; Mauro Dalla Mura; Romain Bange; Roberto Guizzetti

doi:10.1117/12.2675612

5 October 2023 Training dataset optimization for deep learning applied to optical proximity correction on non-regular hole masks

Mathis Urard, Clément Paquet, Charlotte Beylier, Jean-Noël Pena, Alice Caplier, Mauro Dalla Mura, Romain Bange, Roberto Guizzetti

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Proceedings Volume 12802, 38th European Mask and Lithography Conference (EMLC 2023); 128020A (2023) https://doi.org/10.1117/12.2675612
Event: 38th European Mask and Lithography Conference, 2023, Dresden, Germany

Abstract

With the machine learning breakthroughs in the past few years, the number of studies applying this principle to lithography steps is increasing constantly. In this article, the focus does not concern the learning models for OPC masks improvement, but the optimization of the data used for such learning. This part is essential for a good learning process, but has rarely been studied, despite its impact on the output results quality being as important as an improvement of the learning model. Several optimization methods are discussed, each with a specific objective: either reducing learning time, increasing the obtained results quality, or both. To evaluate these different results, classical optical proximity correction simulation tools are used, allowing for a complete evaluation in line with production standards.

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

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Mathis Urard, Clément Paquet, Charlotte Beylier, Jean-Noël Pena, Alice Caplier, Mauro Dalla Mura, Romain Bange, and Roberto Guizzetti "Training dataset optimization for deep learning applied to optical proximity correction on non-regular hole masks", Proc. SPIE 12802, 38th European Mask and Lithography Conference (EMLC 2023), 128020A (5 October 2023); https://doi.org/10.1117/12.2675612

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KEYWORDS

Education and training

Machine learning

Optical proximity correction

Design and modelling

Databases

Photomasks

Data modeling

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