Metrology-class EUV light source based on quasi-continuous copper LPP

Seth L. Cousin; Feng Dong; Matt Hettermann; Dave Houser; Patrick Naulleau

doi:10.1117/12.3012186

10 April 2024 Metrology-class EUV light source based on quasi-continuous copper LPP

Seth L. Cousin, Feng Dong, Matt Hettermann, Dave Houser, Patrick Naulleau

Proceedings Volume 12953, Optical and EUV Nanolithography XXXVII; 129531D (2024) https://doi.org/10.1117/12.3012186
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

In this submission, we introduce the performance and attributes of our broadband EUV source, which is generated using a copper-based laser-produced plasma. This source is currently operational in EUV Tech’s HVM reflectometer and multi-angle reflectometer / scatterometry (ENK) tools.

Citation Download Citation

Seth L. Cousin, Feng Dong, Matt Hettermann, Dave Houser, and Patrick Naulleau "Metrology-class EUV light source based on quasi-continuous copper LPP", Proc. SPIE 12953, Optical and EUV Nanolithography XXXVII, 129531D (10 April 2024); https://doi.org/10.1117/12.3012186

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