NZO reduction via small pitch imaging-based overlay targets

Cheng-Ta Cheng; Hong Ching; Foster Huang; Zephyr Liu; Dor Yehuda; Michael Har-Zvi; Chris Hsieh; Penny Lin; York Yang

doi:10.1117/12.3010703

9 April 2024 NZO reduction via small pitch imaging-based overlay targets

Cheng-Ta Cheng, Hong Ching, Foster Huang, Zephyr Liu, Dor Yehuda, Michael Har-Zvi, Chris Hsieh, Penny Lin, York Yang

Proceedings Volume 12955, Metrology, Inspection, and Process Control XXXVIII; 1295530 (2024) https://doi.org/10.1117/12.3010703
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

On-product overlay (OPO) control in the DRAM process has become a critical component from node to node to produce high device yield. To meet OPO node goals, Non-Zero Offset (NZO) and its stability across lots must be monitored and controlled. NZO is the bias between overlay (OVL) on-target measurement at After Development Inspection (ADI) vs. on-device measurement at After Etching Inspection (AEI). In this paper, we will present Imaging-Based Overlay (IBO) metrology data at ADI of two different marks, segmented AIM® with design rule patterns and robust AIM (rAIM®) with Moiré effect with a small pitch. NZO analysis will be presented for each target type including basic performance.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Cheng-Ta Cheng, Hong Ching, Foster Huang, Zephyr Liu, Dor Yehuda, Michael Har-Zvi, Chris Hsieh, Penny Lin, and York Yang "NZO reduction via small pitch imaging-based overlay targets", Proc. SPIE 12955, Metrology, Inspection, and Process Control XXXVIII, 1295530 (9 April 2024); https://doi.org/10.1117/12.3010703

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