Pattern selection strategy by clustering for logic EPE monitoring

Roy Anunciado; Konstantin Nechaev; Reza Sahraeian; Jeroen Schouwenberg; Guillaume Schelcher; Shubhankar Das; Wei Peng; Stefan van der Sanden; Harm Dillen

doi:10.1117/12.3034649

12 November 2024 Pattern selection strategy by clustering for logic EPE monitoring

Roy Anunciado, Konstantin Nechaev, Reza Sahraeian, Jeroen Schouwenberg, Guillaume Schelcher, Shubhankar Das, Wei Peng, Stefan van der Sanden, Harm Dillen

Author Affiliations +

Proceedings Volume 13215, International Conference on Extreme Ultraviolet Lithography 2024; 1321508 (2024) https://doi.org/10.1117/12.3034649
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Abstract

Measuring EPE on logic devices is challenging due to the large variety of features given its random environment and layout. One has to measure an enormous amount of unique features to estimate CD, PPE, LCDU, and LPE of each feature making it impractical for EPE monitoring due to the large metrology load. We developed a simulation-based pattern clustering method that identifies and classifies features with similar EPE behavior to address this challenge. Both geometric design and imaging behavior of the patterns were taken into account to effectively cluster similar features. We report here the verification results of the clustering method which is measured on-wafer for both random layout lines-spaces and vias. With this we make a step towards identification and selection of EPE critical patterns for logic devices, which can be used further for monitoring and control.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Roy Anunciado, Konstantin Nechaev, Reza Sahraeian, Jeroen Schouwenberg, Guillaume Schelcher, Shubhankar Das, Wei Peng, Stefan van der Sanden, and Harm Dillen "Pattern selection strategy by clustering for logic EPE monitoring", Proc. SPIE 13215, International Conference on Extreme Ultraviolet Lithography 2024, 1321508 (12 November 2024); https://doi.org/10.1117/12.3034649

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