Method to destroy the columnar structure of optical thin films

Wei Zhang; Jian-Ying Fan; Heng-qian Zhao; Y. Mu

doi:10.1117/12.22429

1 December 1990 Method to destroy the columnar structure of optical thin films

Wei Zhang, Jian-Ying Fan, Heng-qian Zhao, Y. Mu

Proceedings Volume 1324, Modeling of Optical Thin Films II; (1990) https://doi.org/10.1117/12.22429
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

A method based on continuously modulating the vapor deposition angle, δ, in the range from 0° < δ < 180° at an appropriate rate is proposed, by which the typical colunmar structure of vapordeposited thin films can be prevented in favor of a more compact structure, similar to a bulk material. The growth rates of such films are quantifed, and the their microstructure is simulated by computer. At the same time, an experimental study has been performed successfully. Lastly, the mechanism underlying these improved properties is analyzed and discussed.

Citation Download Citation

Wei Zhang, Jian-Ying Fan, Heng-qian Zhao, and Y. Mu "Method to destroy the columnar structure of optical thin films", Proc. SPIE 1324, Modeling of Optical Thin Films II, (1 December 1990); https://doi.org/10.1117/12.22429

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