Laser projection UV lithography on subliming resists

Eduard I. Tochitsky; Anatoly I. Sharendo; Victor V. Boksha

doi:10.1117/12.23706

1 October 1990 Laser projection UV lithography on subliming resists

Eduard I. Tochitsky, Anatoly I. Sharendo, Victor V. Boksha

Proceedings Volume 1352, 1st Intl School on Laser Surface Microprocessing; (1990) https://doi.org/10.1117/12.23706
Event: International School on Laser Surface Microprocessing, 1989, Tashkent, Uzbekistan

Abstract

One of the alldry microlithographic processes is considered which includes only two operat ions namely vacuum thermal evaporat ion of the res i st f i lm and subsequent patterning of the mask directly during exposure with laser radiation of A 266 nm. The mask patterning is performed on a projection lithography apparatus. Theoreticaland experimental results indicate that the proposed process permits formation of submicron features with high accuracy and relatively low requirements to the exposure dose control. 1 .

Citation Download Citation

Eduard I. Tochitsky, Anatoly I. Sharendo, and Victor V. Boksha "Laser projection UV lithography on subliming resists", Proc. SPIE 1352, 1st Intl School on Laser Surface Microprocessing, (1 October 1990); https://doi.org/10.1117/12.23706

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