Proximity-compensated kinoforms directly written by e-beam lithography

Mats Ekberg; J. Michael Larsson; Fredrik K. Nikolajeff; Sverker Hard

doi:10.1117/12.138556

5 January 1993 Proximity-compensated kinoforms directly written by e-beam lithography

Mats Ekberg, J. Michael Larsson, Fredrik K. Nikolajeff, Sverker Hard

Proceedings Volume 1718, Workshop on Digital Holography; (1993) https://doi.org/10.1117/12.138556
Event: Workshop on Digital Holography, 1992, Prague, Czech Republic

Abstract

We report on direct-writing EBL manufactured, proximity compensated blazed transmission gratings. The proximity compensation is made using a non-linear iterative process in the spatial domain. The diffraction efficiency for a compensated 8 micron period grating was 84%, almost twice that of an uncompensated grating.

Citation Download Citation

Mats Ekberg, J. Michael Larsson, Fredrik K. Nikolajeff, and Sverker Hard "Proximity-compensated kinoforms directly written by e-beam lithography", Proc. SPIE 1718, Workshop on Digital Holography, (5 January 1993); https://doi.org/10.1117/12.138556

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