Paper
13 January 1993 Diffractive optical elements fabricated by laser direct writing and other techniques
Pierre Langlois, Hubert Jerominek, Luc Leclerc, Jin Pan
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Abstract
Four different thin DOE pattern generation techniques used at National Optics Institute (NOI) are discussed and compared: laser direct writing in photoresist, microlithography with e-beam masks, holographic recording, and laser assisted microfabrication. NOI special equipment used for each technique is described and applications are presented.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Pierre Langlois, Hubert Jerominek, Luc Leclerc, and Jin Pan "Diffractive optical elements fabricated by laser direct writing and other techniques", Proc. SPIE 1751, Miniature and Micro-Optics: Fabrication and System Applications II, (13 January 1993); https://doi.org/10.1117/12.142573
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CITATIONS
Cited by 5 scholarly publications.
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KEYWORDS
Diffractive optical elements

Holography

Etching

Optical lithography

Photoresist materials

Semiconductor lasers

Diffraction

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