Point-of-use laser inspection

Mimi L. Koehler

doi:10.1117/12.142135

26 March 1993 Point-of-use laser inspection

Mimi L. Koehler

Proceedings Volume 1809, 12th Annual BACUS Symposium on Photomask Technology and Management; (1993) https://doi.org/10.1117/12.142135
Event: Photomask Technology, 1992, Sunnyville, CA, United States

Abstract

The use of post-pelliclization inspection is a step toward zero customer return, due to particles on the mask under the pellicle. Implementation of a laser inspection system in wafer fabs allows mask users with the ability to (1) check the quality of incoming masks for shipping related defects, (2) perform on-going reliability checks to reduce mask defect related yield losses, and (3) reduce handling by reducing manual inspection. This paper describes the techniques used in the calibration of the laser inspection system, QC Optics API-3000, and several benefits from this inspection. In addition to calibration, monitoring system performance is critical to the success of this inspection. Types of monitor masks are described here, including methods of generation and uses of monitor masks.

Citation Download Citation

Mimi L. Koehler "Point-of-use laser inspection", Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); https://doi.org/10.1117/12.142135

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available