Paper
6 May 1993 Registration error measurements with coherent optical processors
Xian-Yang Cai, Frank Kvasnik, Roy W. Blore
Author Affiliations +
Proceedings Volume 1907, Machine Vision Applications in Industrial Inspection; (1993) https://doi.org/10.1117/12.144815
Event: IS&T/SPIE's Symposium on Electronic Imaging: Science and Technology, 1993, San Jose, CA, United States
Abstract
A microscope coherent optical processor (M-COP) has been specifically applied to the measurement of registration error in multi-layer integrated circuit wafers. This novel technique has resulted in a simple and elegant method for the inspection of both part- and fully-processed semiconductor wafers. The conventional methods of processed wafer inspection comprise of microscopical examination by skilled operators, extensive electrical parameter testing, and numerical image-processing. To apply any one of these techniques to a single chip on a wafer is extremely time consuming, and the number of samples that can be inspected on a production line is severely limited. However, real-time 100% inspection of wafers is one of the benefits of the inherent high resolution and immense speed of the M-COP. Further benefits are the early detection and location of faults, 100% quality assurance, and continuous condition monitoring.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xian-Yang Cai, Frank Kvasnik, and Roy W. Blore "Registration error measurements with coherent optical processors", Proc. SPIE 1907, Machine Vision Applications in Industrial Inspection, (6 May 1993); https://doi.org/10.1117/12.144815
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KEYWORDS
Semiconducting wafers

Wafer-level optics

Inspection

Spatial filters

Image filtering

Image processing

Microscopes

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