Paper
15 September 1993 Solvents in novolak synthesis
Chet J. Sobodacha, Thomas J. Lynch, Dana L. Durham, Valerie R. Paradis
Author Affiliations +
Abstract
Novolac resins may be prepared with or without a solvent present. We have found that solvent power greatly affects the properties of the finished resin and thus gives the resist chemist another variable with which to `fine-tune' resist properties. Using designed experiments, we investigated the effect of solvent power, as measured by Hansen's Solubility Parameters, of a number of solvents and solvent mixtures on the final properties of the novolac resin. We found that the relative molecular weight (RMW) and dissolution rate of a novolac resin can be varied by selection of a solvent or solvent mixture with the appropriate polarity and hydrogen- bonding characteristics. The solvent polarity and hydrogen-bonding characteristics may affect the stability of the cresol/formaldehyde transition state, thus causing the observed changes in RMW and dissolution rate.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chet J. Sobodacha, Thomas J. Lynch, Dana L. Durham, and Valerie R. Paradis "Solvents in novolak synthesis", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154793
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KEYWORDS
Hydrogen

Photoresist materials

Liquids

Calibration

Error control coding

Photoresist developing

Polymerization

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