New low-cost high heat flux source

Dah Yu Cheng

doi:10.1117/12.163823

12 November 1993 New low-cost high heat flux source

Dah Yu Cheng

Proceedings Volume 1997, High Heat Flux Engineering II; (1993) https://doi.org/10.1117/12.163823
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

Intense heat sources are needed to address new manufacturing techniques, such as, the Rapid Thermal Process for silicon wafer manufacturing. The current technology of high heat flux sources is the laser for its ability to do welding and cutting is well-known. The laser with its coherent radiation allows an image to be focused down to very small sizes to reach extremely high heat flux. But the laser also has problems: it is inefficient in its use because of its singular wave length and brings up OSHA safety related problems. Also heavy industrial manufacturing requires much higher total energy in addition to the high heat flux which makes the current laser system too slow to be economical. The system I am proposing starts with a parabolic curve. If the curve is rotated about the axis of the parabola, it generates the classical parabolic reflector as we know it. On the other hand, when the curve is rotated about the chord, a line passing through the focal point and perpendicular to the axis, generates a new surface called the Orthogonal Parabolic Surface. A new optical reflector geometry is presented which integrates a linear white light (continuum spectra) source through a coherent path to be focused to a very small area.

Citation Download Citation

Dah Yu Cheng "New low-cost high heat flux source", Proc. SPIE 1997, High Heat Flux Engineering II, (12 November 1993); https://doi.org/10.1117/12.163823

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KEYWORDS

Heat flux

Reflectors

Lamps

Semiconducting wafers

Silicon

Xenon

Glasses

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