Direct laser write-on exposure of thick film screens

Janne Remes; Hannu Moilanen; Seppo Leppaevuori; Juha Vaananen; Antti Uusimaki

doi:10.1117/12.167541

1 February 1994 Direct laser write-on exposure of thick film screens

Janne Remes, Hannu Moilanen, Seppo Leppaevuori, Juha Vaananen, Antti Uusimaki

Proceedings Volume 2045, Laser-Assisted Fabrication of Thin Films and Microstructures; (1994) https://doi.org/10.1117/12.167541
Event: Optics Quebec, 1993, Quebec City, Canada

Abstract

The aim of this work was to study the pros and cons of using the laser exposure of thick film screen emulsions (thicknesses 5 - 30 micrometers ) with a mesh count of 200 - 400. A focused Ar⁺ laser, emitting wavelengths in the UV (351 and 365 nm), was utilized in the exposure of commercial negative diazotype emulsions. A special visible sensitized orthochromatic thick film emulsion was used at a wavelength of 488 nm. The Ar⁺ laser beam was focused using an objective with a focal length of 28 mm (UV, apochromatic, NA equals 0.32, spot size 1 micrometers ) and 20 mm (visible, NA equals 0.42, spot size 6 micrometers ). The laser beam was raster scanned with an alignment accuracy of 1 micrometers and unit step of 80 nm and was modulated above the thick film screen.

Citation Download Citation

Janne Remes, Hannu Moilanen, Seppo Leppaevuori, Juha Vaananen, and Antti Uusimaki "Direct laser write-on exposure of thick film screens", Proc. SPIE 2045, Laser-Assisted Fabrication of Thin Films and Microstructures, (1 February 1994); https://doi.org/10.1117/12.167541

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