Misalignment sensitivity analysis of planar optical interconnect systems

David E. Zaleta; Susant K. Patra; Jian Ma; Sing H. Lee

doi:10.1117/12.174528

2 May 1994 Misalignment sensitivity analysis of planar optical interconnect systems

David E. Zaleta, Susant K. Patra, Jian Ma, Sing H. Lee

Proceedings Volume 2153, Optoelectronic Interconnects II; (1994) https://doi.org/10.1117/12.174528
Event: OE/LASE '94, 1994, Los Angeles, CA, United States

Abstract

In order to fabricate practical free-space optical interconnect systems, a thorough understanding of the effect of optical misalignment on the power throughput of an optical link is required. Further, not only assembly tolerances (resulting in misalignment) but also component manufacturing tolerances that also introduce vignetting into the optical system need to be studied. We present a study of a wide variety of assembly and component manufacturing errors and their effect on the integrated power falling onto the detector for planar space variant optical systems. We also discuss the trends of the different misalignment sensitivities as the interconnect distance increases.

Citation Download Citation

David E. Zaleta, Susant K. Patra, Jian Ma, and Sing H. Lee "Misalignment sensitivity analysis of planar optical interconnect systems", Proc. SPIE 2153, Optoelectronic Interconnects II, (2 May 1994); https://doi.org/10.1117/12.174528

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