Paper
11 March 1994 Advanced pattern inspection using Macroview
Moritoshi Ando, Hideo Okada, Yoshikazu Kakinoki
Author Affiliations +
Proceedings Volume 2183, Machine Vision Applications in Industrial Inspection II; (1994) https://doi.org/10.1117/12.171203
Event: IS&T/SPIE 1994 International Symposium on Electronic Imaging: Science and Technology, 1994, San Jose, CA, United States
Abstract
The new pattern inspection algorithm we developed detects fatal defects on printed wiring boards. The algorithm determines whether patterns identified by an automated pattern inspection (AOI) system are actually defective by considering the electrical malfunction that the defect will cause. A macroscopic model based on the pattern design rules and their tolerances to pattern violations is needed to evaluate defects. The algorithm classifies features around a defective pattern into 50 categories and compares the defect distribution with preset check rules. The automated optical verification system we developed captures pattern images with a CCD camera and uses verification software to evaluate defects. The process takes 10 seconds per image. We tested the system on the factory floor, and it detected all defects with less than 4.8 percent of false alarms.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Moritoshi Ando, Hideo Okada, and Yoshikazu Kakinoki "Advanced pattern inspection using Macroview", Proc. SPIE 2183, Machine Vision Applications in Industrial Inspection II, (11 March 1994); https://doi.org/10.1117/12.171203
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KEYWORDS
Inspection

Defect detection

Copper

Algorithm development

Image processing

Computer aided design

Sensors

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