Reliability improvement of integrated circuits through alkali contamination reduction in dielectric films

Carrie Lundquist; Tara Allen; Rafael Delgado; S. Dunnigan; J. Cadenhead; Karl E. Mautz; Jim Peterson; H. Stevens

doi:10.1117/12.186755

14 September 1994 Reliability improvement of integrated circuits through alkali contamination reduction in dielectric films

Carrie Lundquist, Tara Allen, Rafael Delgado, S. Dunnigan, J. Cadenhead, Karl E. Mautz, Jim Peterson, H. Stevens

Author Affiliations +

Proceedings Volume 2334, Microelectronics Manufacturability, Yield, and Reliability; (1994) https://doi.org/10.1117/12.186755
Event: Microelectronic Manufacturing, 1994, Austin, TX, United States

Abstract

As geometries continue to shrink, the reduction of alkali ion contamination in integrated circuits is imperative. A Motorola factory established a goal to achieve greater than an order of magnitude reduction in alkali ion levels through characterization and elimination of the sources. Various teams contributed to the overall goal by identifying sources and focusing on reducing or eliminating the alkali ion levels. Reliability improvements have been accomplished over the past three years utilizing this methodology.

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Carrie Lundquist, Tara Allen, Rafael Delgado, S. Dunnigan, J. Cadenhead, Karl E. Mautz, Jim Peterson, and H. Stevens "Reliability improvement of integrated circuits through alkali contamination reduction in dielectric films", Proc. SPIE 2334, Microelectronics Manufacturability, Yield, and Reliability, (14 September 1994); https://doi.org/10.1117/12.186755

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