Novel inorganic photoinitiators

Charles Kutal; Bentley J. Palmer; Zhikai Wang

doi:10.1117/12.210372

9 June 1995 Novel inorganic photoinitiators

Charles Kutal, Bentley J. Palmer, Zhikai Wang

Proceedings Volume 2438, Advances in Resist Technology and Processing XII; (1995) https://doi.org/10.1117/12.210372
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

Thin films composed of the copolymer of glycidyl methacrylate-ethyl acrylate and a cobalt(III)-am(m)ine tetraphenylborate salt undergo crosslinking upon deep-UV irradiation and subsequent heating. The mechanism of this process involves the efficient photoredox decomposition of the cobalt salt with the release of multiequivalents of Lewis base. In a thermally activated step, the base then crosslinks the copolymer via nucleophilic attack on the epoxide rings. Near-UV irradiation of Pt(acac)₂ (acac is the acetylacetonate anion) and Ru(Cp)₂ (Cp is the cyclopentadienide anion) dissolved in ethyl (alpha) -cyanoacrylate initiates rapid anionic polymerization of the acrylate monomer. The active initiating species is acac in the former system, while the radical anion of the monomer is a likely candidate in the latter system.

Citation Download Citation

Charles Kutal, Bentley J. Palmer, and Zhikai Wang "Novel inorganic photoinitiators", Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); https://doi.org/10.1117/12.210372

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