New system for fast submicron laser direct writing

Heinz Kueck; Michael Bollerott; Wolfgang Doleschal; Andreas Gehner; Wolfram Grundke; Detlef Kunze; Rolf Melcher; Joerg Paufler; Rolf Seltmann; Guenter Zimmer

doi:10.1117/12.209280

26 May 1995 New system for fast submicron laser direct writing

Heinz Kueck, Michael Bollerott, Wolfgang Doleschal, Andreas Gehner, Wolfram Grundke, Detlef Kunze, Rolf Melcher, Joerg Paufler, Rolf Seltmann, Guenter Zimmer

Author Affiliations +

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209280
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

We report on a new system for submicron lithography by fast laser direct writing, where a programmable phase modulating spatial light modulator (SLM) is imaged onto the wafer using flash on the fly exposure with an excimer laser light source. This new principle for maskless optical lithography has been investigated for the first time. A SLM with 512 X 464 pixels has been developed and fabricated using a CMOS active matrix and a reflective, deformable viscoelastic layer on top. Using this light modulator for image generation a demonstrator exposure tool for 0.6 micrometers minimum feature size has been designed and set up including all the components necessary for the exposure of a complete lithographic layer from CAD layout data. The demonstrator is shown to give good quality photoresist pattern on the wafer at a throughput of roughly one 4"-wafer per hour. Based on our experimental results we propose a tool with a throughput of nine 6"-wafers per hour and conclude that the new principle of operation has the potential of high performance optical direct writing lithography.

Citation Download Citation

Heinz Kueck, Michael Bollerott, Wolfgang Doleschal, Andreas Gehner, Wolfram Grundke, Detlef Kunze, Rolf Melcher, Joerg Paufler, Rolf Seltmann, and Guenter Zimmer "New system for fast submicron laser direct writing", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209280

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