Paper
25 September 1995 Fabrication of high-resolution x-ray diffractive optics at King's College London
Pambos S. Charalambous, Peter A. F. Anastasi, Ronald E. Burge, Katia Popova
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Abstract
The fabrication of high resolution x-ray diffractive optics, and Fresnel zone plates (ZPs) in particular, is a very demanding multifaceted technological task. The commissioning of more (and brighter) synchrotron radiation sources, has increased the number of x-ray imaging beam lines world wide. The availability of cheaper and more effective laboratory x-ray sources, has further increased the number of laboratories involved in x-ray imaging. The result is an ever increasing demand for x-ray optics with a very wide range of specifications, reflecting the particular type of x-ray imaging performed at different laboratories. We have been involved in all aspects of high resolution nanofabrication for a number of years, and we have explored many different methods of lithography, which, although unorthodox, open up possibilities, and increase our flexibility for the fabrication of different diffractive optical elements, as well as other types of nanostructures. The availability of brighter x-ray sources, means that the diffraction efficiency of the ZPs is becoming of secondary importance, a trend which will continue in the future. Resolution, however, is important and will always remain so. Resolution is directly related to the accuracy af pattern generation, as well as the ability to draw fine lines. This is the area towards which we have directed most of our efforts so far.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Pambos S. Charalambous, Peter A. F. Anastasi, Ronald E. Burge, and Katia Popova "Fabrication of high-resolution x-ray diffractive optics at King's College London", Proc. SPIE 2516, X-Ray Microbeam Technology and Applications, (25 September 1995); https://doi.org/10.1117/12.221663
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Cited by 3 scholarly publications.
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KEYWORDS
Contamination

X-ray optics

Etching

Lithography

Polymethylmethacrylate

Semiconducting wafers

X-rays

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