Side-lobe suppression in halftone PSM with optical proximity correction

In-Gyun Shin; Sung-Chul Lim; Sang-Gyun Woo; Woo-Sung Han; Young-Bum Koh

doi:10.1117/12.228182

8 December 1995 Side-lobe suppression in halftone PSM with optical proximity correction

In-Gyun Shin, Sung-Chul Lim, Sang-Gyun Woo, Woo-Sung Han, Young-Bum Koh

Proceedings Volume 2621, 15th Annual BACUS Symposium on Photomask Technology and Management; (1995) https://doi.org/10.1117/12.228182
Event: 15th Annual BACUS Symposium on Photomask Technology and Management '95, 1995, Santa Clara, CA, United States

Abstract

We simulated half-tone phase shifting masks (HT-PSMs) with dummy patterns where side-lobe effects occur. The result is that 180 degree phase angle dummy patterns between contact holes help to reduce side-lobe effects without losing peak intensities of mask patterns. We prepared experimental masks according to the optimum results of simulation, and the actual experiment produced the same results reducing side-lobe effects as the simulation.

Citation Download Citation

In-Gyun Shin, Sung-Chul Lim, Sang-Gyun Woo, Woo-Sung Han, and Young-Bum Koh "Side-lobe suppression in halftone PSM with optical proximity correction", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); https://doi.org/10.1117/12.228182

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available