Germanium waveguide for optical interconnects in very large scale integrated optics

Madan Dubey; Richard T. Lareau; Melanie W. Cole; Kenneth A. Jones; Lawrence C. West; Charles W. Roberts; Emil C. Piscani

doi:10.1117/12.229956

10 January 1996 Germanium waveguide for optical interconnects in very large scale integrated optics

Madan Dubey, Richard T. Lareau, Melanie W. Cole, Kenneth A. Jones, Lawrence C. West, Charles W. Roberts, Emil C. Piscani

Author Affiliations +

Proceedings Volume 2695, Functional Photonic and Fiber Devices; (1996) https://doi.org/10.1117/12.229956
Event: Photonics West '96, 1996, San Jose, CA, United States

Abstract

The Fourier Transform Infrared (FTIR) absorption spectrum for the range of 500 to 4000 cm^-1 wavenumbers was measured for several Ge films deposited on GaAs using ultra high vacuum E-beam deposition at various substrate temperatures ranging from room temperature (RT) to 500 degree(s)C. Using transmission electron microscopy, we show that Ge films deposited at room temperature and 100 degree(s)C on a (100) GaAs surface that did not have the oxides removed are amorphous while those deposited at 100 degree(s)C with the oxide removed are crystalline, but are highly defective. Secondary ion mass spectroscopy (SIMS) measurements show that the amorphous films at RT contain more than two orders of magnitude more oxygen than the films deposited at 100 degree(s)C or a single crystal film deposited at 400 degree(s)C. The oxygen-18 diffusion studies definitively show that the excess oxygen in the amorphous films percolates in from the atmosphere. SIMS studies further reveal that thermally removing the GaAs substrate surface oxide or depositing a Au film on top of the Ge film has little effect on the incorporation of oxygen.

Citation Download Citation

Madan Dubey, Richard T. Lareau, Melanie W. Cole, Kenneth A. Jones, Lawrence C. West, Charles W. Roberts, and Emil C. Piscani "Germanium waveguide for optical interconnects in very large scale integrated optics", Proc. SPIE 2695, Functional Photonic and Fiber Devices, (10 January 1996); https://doi.org/10.1117/12.229956

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