Paper
11 March 1996 Structure and properties of porous GaAs
Yu. N. Buzynin, S. A. Gusev, M. N. Drozdov, Yu. N. Drozdov, Z. F. Krasilnik, A. V. Murel, Dmitry G. Revin, Vladimir I. Shashkin, I. Yu. Shuleshova
Author Affiliations +
Proceedings Volume 2777, ALT'95 International Symposium on Advanced Materials for Optics and Optoelectronics; (1996) https://doi.org/10.1117/12.232225
Event: ALT '95 International Conference: Advanced Materials for Optics and Optoelectronics, 1995, Prague, Czech Republic
Abstract
In this paper we report the first results obtained in the study on the properties of porous GaAs (P-GaAs) produced by electrochemical etching in electrolytes on the basis of hydrofluoric acid. As the initial material we used monocrystalline n- and p-type (100)GaAs substrates Te- and Zn-doped to 2*1018 cm-3 and 6*1018 cm-3, respectively. The substrates were subjected to chemical-mechanical and diamond-paste polish. Etching was performed in an electrolytic cell with a platinum cathode in the galvanostatic regime with anode current densities ranging from 5 to 150 mA/cm2. We were interested in P-GaAs layers with thicknesses from 0.5 to 50 micrometers. The methods used in the study of P-GaAs samples included x-ray diffractometry, electron microscopy, x-ray microanalysis, secondary ion-mass spectroscopy, electrochemical C-V profiling and photoluminescence.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yu. N. Buzynin, S. A. Gusev, M. N. Drozdov, Yu. N. Drozdov, Z. F. Krasilnik, A. V. Murel, Dmitry G. Revin, Vladimir I. Shashkin, and I. Yu. Shuleshova "Structure and properties of porous GaAs", Proc. SPIE 2777, ALT'95 International Symposium on Advanced Materials for Optics and Optoelectronics, (11 March 1996); https://doi.org/10.1117/12.232225
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KEYWORDS
Gallium arsenide

Surface finishing

Gallium

Polishing

Crystals

Arsenic

Chemical elements

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