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An analytical description of temperature dependence of resistance in a classical percolation system is presented for the first time. Three concentration ranges of conductive phase -- below and above percolation threshold as well as inside smearing region -- have been analyzed. Useability of presented results has been discussed for such random inhomogeneous media as cermet and polymer thick film resistors as well as cermet thin film ones.
Andrei A. Snarskii,Andrzej Dziedzic, andBenedykt W. Licznerski
"Temperature dependence of resistance in percolation systems", Proc. SPIE 2780, Metal/Nonmetal Microsystems: Physics, Technology, and Applications, (8 April 1996); https://doi.org/10.1117/12.238130
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Andrei A. Snarskii, Andrzej Dziedzic, Benedykt W. Licznerski, "Temperature dependence of resistance in percolation systems," Proc. SPIE 2780, Metal/Nonmetal Microsystems: Physics, Technology, and Applications, (8 April 1996); https://doi.org/10.1117/12.238130