Orientational stability of NLO chromophores in the polar matrix of poly-(alpha-methyl-styrene)

C. P. Hendricks; Michael Biebricher; Hilmar Franke

doi:10.1117/12.251834

30 September 1996 Orientational stability of NLO chromophores in the polar matrix of poly-(α-methyl-styrene)

C. P. Hendricks, Michael Biebricher, Hilmar Franke

Proceedings Volume 2851, Photopolymer Device Physics, Chemistry, and Applications III; (1996) https://doi.org/10.1117/12.251834
Event: SPIE's 1996 International Symposium on Optical Science, Engineering, and Instrumentation, 1996, Denver, CO, United States

Abstract

As a guest host system the poling behavior of the nonlinear dye in the polymer poly-(alpha) -methyl-styrene (P(alpha) MS) is investigated. The waveguides are studied as a part of a multilayer system on top of a ferroelectric buffer layer of P(VDF-TrFE). The orientational stability is measured on line by monitoring the waveguide anisotropy during poling and relaxation. The electric field depends on the layer thicknesses and the orientational stability strongly depends especially on the thickness of the ferroelectric buffer layer. At optimum conditions a permanent remanence of anisotropy oriented in the electrical field of the oriented ferroelectric buffer of about 60 percent is found. Thermal annealing of P(alpha) MS just below its glass transition temperature creates ferroelectricity in the P(alpha) MS matrix itself increasing orientational stability of the NLO dye to 75 percent.

Citation Download Citation

C. P. Hendricks, Michael Biebricher, and Hilmar Franke "Orientational stability of NLO chromophores in the polar matrix of poly-(α-methyl-styrene)", Proc. SPIE 2851, Photopolymer Device Physics, Chemistry, and Applications III, (30 September 1996); https://doi.org/10.1117/12.251834

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