Electronic image adjustment device for e-beam lithography

Warren K. Waskiewicz

doi:10.1117/12.255506

25 October 1996 Electronic image adjustment device for e-beam lithography

Warren K. Waskiewicz

Proceedings Volume 2858, Charged-Particle Optics II; (1996) https://doi.org/10.1117/12.255506
Event: SPIE's 1996 International Symposium on Optical Science, Engineering, and Instrumentation, 1996, Denver, CO, United States

Abstract

A cumbersome necessity in lithography tools is the need to provide for a mechanical wafer rotation in order to achieve overlay. In contrast to photolithographic tools, charged particle lithography systems potentially offer a non- mechanical means of adjusting image orientation through the use of magnetic fields. I have identified a type of device, based upon simple, solenoid-like coils, which can simultaneously provide independent electronic adjustments to both image rotation and magnification. The implementation of such a device in a SCALPEL^TM-based proof-of-lithography tool is presented as a practical example.

Citation Download Citation

Warren K. Waskiewicz "Electronic image adjustment device for e-beam lithography", Proc. SPIE 2858, Charged-Particle Optics II, (25 October 1996); https://doi.org/10.1117/12.255506

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