Metrology and quantification of micromilled x-ray masks and exposures

Craig Friedrich; Philip Coane; Joe Goettert; Niranjan Gopinathin

doi:10.1117/12.275776

7 July 1997 Metrology and quantification of micromilled x-ray masks and exposures

Craig Friedrich, Philip Coane, Joe Goettert, Niranjan Gopinathin

Proceedings Volume 3048, Emerging Lithographic Technologies; (1997) https://doi.org/10.1117/12.275776
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

Micromechanical milling has been shown to be a rapid and direct method for the production of x-ray masks with features within the process limits. A method for compensating milling tool run out has been adapted and the tolerance of mask absorber features has been reduced to approximately 0.5 micrometers. The milling process leaves some absorber burrs and the absorber is also tapered at the machined wall which introduces an additional process bias, both of which add to exposure degradation. Nevertheless, both of these effects can be greatly reduced with further work.

Citation Download Citation

Craig Friedrich, Philip Coane, Joe Goettert, and Niranjan Gopinathin "Metrology and quantification of micromilled x-ray masks and exposures", Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); https://doi.org/10.1117/12.275776

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