Fluorescence detection of photoacid in chemically amplified resists

Andrew R. Eckert; Wayne M. Moreau

doi:10.1117/12.275890

7 July 1997 Fluorescence detection of photoacid in chemically amplified resists

Andrew R. Eckert, Wayne M. Moreau

Proceedings Volume 3049, Advances in Resist Technology and Processing XIV; (1997) https://doi.org/10.1117/12.275890
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

An analytical technique for measuring photoacid in chemically amplified resist using fluorescence spectroscopy has been developed. The range of detection from picograms to micrograms, offers a versatile alternative to standard practices of acid detection such as photometric bleaching by UV-Vis absorption spectroscopy. Quantum yields of photoacid generation were measured for films of poly 4-t- butoxycarbonyloxystyrene, PBOCST, and poly hydroxystyrene, PHS, containing the i-line photosensitizer anthracene. Four distinct photoacid generators, PAGs, were compared, two triphenyl sulfonium salts with triflic acid and trifluoromethyl phenyl sulfonic acid, and two sulfonate esters of an n-hydroxyimide that generate triflic acid and trifluoromethyl phenyl sulfonic acid. The ionic PAGs have a quantum yield of approximately 6 - 8 multiplied by 10^-4 and the covalent PAGs range from 2 multiplied by 10^-5 to 6 multiplied by 10^-4. The inadequate amount of acid produced at a nominal dose of 100 mJ/cm² requires a catalytic chain length that is impractical in standard amplified systems.

Citation Download Citation

Andrew R. Eckert and Wayne M. Moreau "Fluorescence detection of photoacid in chemically amplified resists", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); https://doi.org/10.1117/12.275890

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