Paper
20 April 1998 Photothermal measuring techniques using pulsed laser
Volker Neumann, Peter Meja, Bernhard Steiger
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Abstract
An experimental set-up using different pulsed photothermal measuring techniques is presented. The set-up allows investigation of different optical components byu means of the photothermal reflectance microscopy, photothermal transmittance microscopy and the photothermal deflection microscopy both in reflection and transmission. The methods are based on different effects, such as a surface bending caused by thermally induced stress and thermal stress dependence of the refractive index. Therefore and in consequence of different reflectance's of the components, each photothermal techniques has different measuring sensitivity. The combination of several photothermal techniques allows an investigation of all optical component classes. Otherwise, more information could be determined about optical, thermal and mechanical properties of components. The experimental results of various optical components are presented. The absorbance, reflectance, transmittance and thermally conductivity are discussed on the basis of temporally measured signal curves. Thermally induced stress was also detected by means of the photothermal deflection microscopy in transmission.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Volker Neumann, Peter Meja, and Bernhard Steiger "Photothermal measuring techniques using pulsed laser", Proc. SPIE 3244, Laser-Induced Damage in Optical Materials: 1997, (20 April 1998); https://doi.org/10.1117/12.306985
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KEYWORDS
Microscopy

Pulsed laser operation

Reflectivity

Optical components

Transmittance

Absorbance

Reflection

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