Increased production using excimer lasers through enhanced beam utilization factors

Jeffrey P. Sercel

doi:10.1117/12.309509

3 June 1998 Increased production using excimer lasers through enhanced beam utilization factors

Jeffrey P. Sercel

Proceedings Volume 3274, Laser Applications in Microelectronic and Optoelectronic Manufacturing III; (1998) https://doi.org/10.1117/12.309509
Event: Optoelectronics and High-Power Lasers and Applications, 1998, San Jose, CA, United States

Abstract

Excimer lasers are the third major classification of industrial laser in use today (the first being CO₂ lasers and the second being solid state lasers, such as YAG). Excimer lasers are used with far field mask image projection techniques, and as such are potentially inefficient due to UV photons being lost at the mask. Cost effective materials processing requires that the maximum amount of available UV photons are efficiently utilized. This paper outlines some of the latest excimer laser beam delivery techniques currently used for high volume micromachining and via drilling production applications. UV solid state lasers are increasing in average power and beam quality but are still limited to a few watts of average power. New mask illumination techniques can improve production throughputs by factors of 2X to >10X over conventional excimer mask projection processing. This paper discusses methods currently available applying the high average power of 50 to 100 watts available with increasing cost effectiveness.

Citation Download Citation

Jeffrey P. Sercel "Increased production using excimer lasers through enhanced beam utilization factors", Proc. SPIE 3274, Laser Applications in Microelectronic and Optoelectronic Manufacturing III, (3 June 1998); https://doi.org/10.1117/12.309509

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