Electron Beam Versus Optical Step-And-Repeat: A 10X Reticle And 1X Die Distortion Study Employing Nikon X-Y Laser Interferometric Metrology

Steven K. Dunbrack; Gary Burns

doi:10.1117/12.933580

13 September 1982 Electron Beam Versus Optical Step-And-Repeat: A 10X Reticle And 1X Die Distortion Study Employing Nikon X-Y Laser Interferometric Metrology

Steven K. Dunbrack, Gary Burns

Author Affiliations +

Proceedings Volume 0334, Optical Microlithography I: Technology for the Mid-1980s; (1982) https://doi.org/10.1117/12.933580
Event: 1982 Microlithography Conferences, 1982, Santa Clara, United States

Abstract

It is becoming apparent that optical lithography will remain the dominant imaging technique in the production of semiconductor devices for some time to come. Production devices with a minimum feature size of 1.5 microns have been manufactured using lx, 5X and 10X wafer steppers. Lenses are presently being designed with higher numerical apertures and promise a resolution of one micron or less. Full field exposure instruments employing mid to deep ultraviolet illumination also promise a resolution down to one micron or less. It has taken the better part of a decade to perfect technologies in the 3-5 micron region, and it will probably take the better part of the present decade to perfect technologies in the 1-2 micron region. If optical lithography can serve our requirements for a 1-2 micron technology, photomasks will remain an important part of the overall photolithographic process. In order to achieve a 1-2 micron technology, some considerable demands will be made of the photomask manufacturer, especially in the area of overlay accuracy.

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Steven K. Dunbrack and Gary Burns "Electron Beam Versus Optical Step-And-Repeat: A 10X Reticle And 1X Die Distortion Study Employing Nikon X-Y Laser Interferometric Metrology", Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); https://doi.org/10.1117/12.933580

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KEYWORDS

Distortion

Reticles

Overlay metrology

Photomasks

Optical lithography

Manufacturing

Optics manufacturing

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