Control of the interaction of metals with fluorinated silicon oxides

Sara E. Kim; Christoph O. Steinbruchel; Atul Kumar; H. Bakhru

doi:10.1117/12.324045

4 September 1998 Control of the interaction of metals with fluorinated silicon oxides

Sara E. Kim, Christoph O. Steinbruchel, Atul Kumar, H. Bakhru

Proceedings Volume 3508, Multilevel Interconnect Technology II; (1998) https://doi.org/10.1117/12.324045
Event: Microelectronic Manufacturing, 1998, Santa Clara, CA, United States

Abstract

Metal films (Al, Cu-1%Al, Cu) were deposited on fluorinated silicon oxide (FSG) of varying fluorine (F) content, obtained from plasma-enhanced chemical vapor deposition, either directly or with a barrier layer (Ta, TaN, TiN) in between. Compositional analysis was done with FTIR and nuclear reaction analysis (NRA), and depth profiles were performed with XPS and NRA. The dielectric constant of the FSG films is shown to be a combined function of film density and F content. This points to structural differences between FSG and undoped SiO₂ films. For Al and Cu-1%Al on FSG, rapid diffusion of F atoms through the metal occurs at typical annealing conditions. With Al, the diffused F accumulates on the top metal surface, and practically no F is present in the bulk of the film. With Cu- 1%Al, surface accumulation and an appreciable bulk concentration of F are observed. With Cu, no significant F diffusion was detectable. Neither Ta nor TaN are good barriers against F diffusion into the metals. On the other hand, TiN may be a useful barrier, as it shows no significant F diffusion but some reaction with F at the Al/TiN interface. A suitable plasma treatment of the FSG before metal deposition can inhibit substantially F diffusion.

Citation Download Citation

Sara E. Kim, Christoph O. Steinbruchel, Atul Kumar, and H. Bakhru "Control of the interaction of metals with fluorinated silicon oxides", Proc. SPIE 3508, Multilevel Interconnect Technology II, (4 September 1998); https://doi.org/10.1117/12.324045

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available