Laser damage of optical coatings from UV to deep UV at 193 nm

Jean Dijon; Etienne Quesnel; Catherine Pelle; Roland Thielsch

doi:10.1117/12.344439

7 April 1999 Laser damage of optical coatings from UV to deep UV at 193 nm

Jean Dijon, Etienne Quesnel, Catherine Pelle, Roland Thielsch

Proceedings Volume 3578, Laser-Induced Damage in Optical Materials: 1998; (1999) https://doi.org/10.1117/12.344439
Event: Laser-Induced Damage in Optical Materials: 1998, 1998, Boulder, CO, United States

Abstract

Scanning electron microscope observations off damaged coatings from 355nm to 193nm are reported. From these results it appears that oxide based coating are strongly limited at 193nm while they performed very well at the other wavelength. Damages occurs at the coating surface for oxides while they concern both surface and substrate interfaces with fluoride base coatings. While fluorides have a better threshold than oxide at 193nm they are limited by localized defects. The ability to overcome this limitation with ion beam sputtering fluoride material at 193nm starting from results at 355nm.

Citation Download Citation

Jean Dijon, Etienne Quesnel, Catherine Pelle, and Roland Thielsch "Laser damage of optical coatings from UV to deep UV at 193 nm", Proc. SPIE 3578, Laser-Induced Damage in Optical Materials: 1998, (7 April 1999); https://doi.org/10.1117/12.344439

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