Advanced refractory-metal and process technology for the fabrication of x-ray masks

Cameron J. Brooks; Kenneth C. Racette; Michael J. Lercel; Lynn A. Powers; Douglas E. Benoit

doi:10.1117/12.351107

25 June 1999 Advanced refractory-metal and process technology for the fabrication of x-ray masks

Cameron J. Brooks, Kenneth C. Racette, Michael J. Lercel, Lynn A. Powers, Douglas E. Benoit

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351107
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

This paper provides an in-depth report of the advanced materials and process technology being developed for x-ray mask manufacturing at IBM. Masks using diamond membranes as replacement for silicon carbide are currently being fabricated. Alternate tantalum-based absorbers, such as tantalum boron, which offer improved etch resolution and critical dimension control, as well as higher x-ray absorption, are also being investigated. In addition to the absorber studies, the development of conductive chromium- based hard-mask films to replace the current silicon oxynitride layer is being explored. The progress of this advanced-materials work, which includes significant enhancements to x-ray mask image-placement performance, will be outlined.

Citation Download Citation

Cameron J. Brooks, Kenneth C. Racette, Michael J. Lercel, Lynn A. Powers, and Douglas E. Benoit "Advanced refractory-metal and process technology for the fabrication of x-ray masks", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351107

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